GLANZOX
With the increasing integration of semiconductor devices and the larger size of wafers, silicon polished surfaces are required to be perfectly mirror-like with higher flatness, damage-, haze- and heavy metal contamination free, including nanotopology. The GLANZOX was developed to meet such requirement.
Features
- It disperses colloidal silica into a special composition liquid, enabling perfect polished surface.
Applications
- Polishing for silicon wafers during primary, secondary and final process
